The NanoAccel process has been applied to a variety of optical materials to provide angstrom level smoothing of starting materials with a Ra of <500nm. Materials processed include Silicon Carbide, Silica, Aluminum, Zinc Sulfide, Germanium, Calcium Fluoride, MgF2, SiC, BK7, and Polycrystalline Diamond.
Removal of nano-scale scratches, pits, asperities, and subsurface damage
NanoAccel is a dry-no-touch process that through its mechanism of action removes nano-scale asperities, pits, polishing scratches, and contaminates, and eliminates subsurface damage. AFM images demonstrate surface scatches, pits and asperities on substrate prior to processing as compared to material surfaces post processing.
Atomic force microscope (AFM) images are compared below.